Ebook Computational Explorations in Magnetron Sputtering, by E. J. McInerney
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Computational Explorations in Magnetron Sputtering, by E. J. McInerney
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Magnetron Sputtering is a widely used industrial process for depositing thin films. PVD films are found in everything from the moisture barriers in potato chip bags to the interconnects of modern semiconductor devices. This book walks you through the physics of Magnetron Sputtering in a step-by-step fashion. Starting with the magnetic fields crucial to efficient operation, the book then looks at the electric fields that power the sputter process, the motion of electrons in the plasma, target erosion and finally deposition. The reader is encouraged to explore this fascinating topic by actively following along. A series of simple computer models is developed, ultimately leading to predictive models of target erosion and deposition uniformity. By working through these models, readers can build their intuition of PVD processes and develop a deeper appreciation of the underlying physics.
- Sales Rank: #2334101 in Books
- Published on: 2014-10-31
- Original language: English
- Dimensions: 9.00" h x .36" w x 6.00" l,
- Binding: Paperback
- 156 pages
About the Author
Jack McInerney is a senior staff scientist in the Computational Modeling group of Lam Research. His computational explorations have ranged broadly from barbecuing meat to plasma physics. He has authored over 30 technical papers and holds more than a dozen patents.
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From the book the reader gets good overview on what can be accomplished with relatively simple ...
By surpan
Magnetron sputtering is one of most commonly used physical vapor deposition (PVD) techniques. Thin films prepared by magnetron sputtering are used in wide range of technologies such as microelectronics, photovoltaics, optics, optoelectronics, tribology, biomedicine, etc. Magnetron sputtering has been used in laboratories and industrial practice for almost 50 years yet only few books are dedicated to the technique. The book Computational Explorations in Magnetron Sputtering by E. J. McInerney focuses on the modeling of sputtering process in magnetrons. The author describes magnetron sputtering in several chapters starting with the design of magnets in the magnetron, plasma physics, sputtering process and ultimately to the deposition of thin films. In every chapter computational code, written in computer program Mathematica, is described in detail and numerous examples of calculations are provided. The author makes an effort to optimize the code so it can be run in reasonable time on ordinary laptop computer.
From the book the reader gets good overview on what can be accomplished with relatively simple modeling. The book gives an insight in underlying processes that occur in the magnetron plasma. It also provides more practical predictions about the target erosion profiles, deposition rates and uniformity of the process, which are especially important for those who use magnetron sputtering in their profession. The purpose of the book is to acquaint the reader with the modeling of magnetron sputtering, however, in every chapter the author also provides short descriptions of underlying physics and points to relevant references in the literature.
Computational Explorations in Magnetron Sputtering should be an essential book not only for those who are interested in modeling but also for everyone who use the technique professionally and want to expand their knowledge on magnetron sputtering. For this reason, I recommend this book to wide range of readers: from undergraduate students that are only being acquainted with the technique to those who are already experienced in the art of depositing thin films by magnetron sputtering.
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